T. Ishii

0.1- mu m-gate, ultrathin-film CMOS devices using SIMOX substrate with 80-nm-thick buried oxide layer

Yasuhisa Ōmura, Satοru Nakashima, K. Izumi et al. · IEEE Transactions on Electron Devices · 1993 · 90 citations

Simox Substrate, Electrical Engineering, Engineering +14

Spectral encoding and decoding of 10 Gbit/s femtosecondpulses using high resolution arrayed-waveguide grating

Hiroyuki Tsuda, Hirokazu Takenouchi, T. Ishii et al. · Electronics Letters · 1999 · 89 citations

30-nm two-step recess gate InP-Based InAlAs/InGaAs HEMTs

Tetsuya Suemitsu, Hideaki Yokoyama, T. Ishii et al. · IEEE Transactions on Electron Devices · 2002 · 73 citations

Electrical Engineering, Two-step Recess Gate, Engineering +9

Second- and third-order dispersion compensator using a high-resolution arrayed-waveguide grating

Hiroyuki Tsuda, K. Okamoto, T. Ishii et al. · IEEE Photonics Technology Letters · 1999 · 65 citations

Photonics, Engineering, Optical Transmission System +12

Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography

Kimiyoshi Deguchi, Kazunori Miyoshi, T. Ishii et al. · Japanese Journal of Applied Physics · 1992 · 59 citations

Optical Materials, Engineering, Electron-beam Lithography +21