In‐Shik Han

Characterization of Random Telegraph Signal Noise of High-Performance p-MOSFETs With a High-$k$ Dielectric/Metal Gate

Hyuk-Min Kwon, In‐Shik Han, Jung-Deuk Bok et al. · IEEE Electron Device Letters · 2011 · 33 citations

Dielectric/metal Gate, Electrical Engineering, Sub Xmlns +10

Instability dependent upon bias and temperature stress in amorphous‐indium gallium zinc oxide (a‐IGZO) thin‐film transistors

Kwang‐Il Choi, Dong‐Ho Nam, Jeong‐Gyu Park et al. · Journal of the Society for Information Display · 2009 · 19 citations

Engineering, Thin Film Process Technology, Semiconductor Device +16

Analysis of reliability characteristics of high capacitance density MIM capacitors with SiO2–HfO2–SiO2 dielectrics

Sang-Uk Park, Chang-Yong Kang, Hyuk-Min Kwon et al. · Microelectronic Engineering · 2010 · 19 citations

Electrical Engineering, Engineering, Sio2–hfo2–sio2 Dielectrics +3

Effects of Fluorine on the NBTI Reliability and Low-Frequency Noise Characteristics of p-MOSFETs

Sung-Kyu Kwon, Hyuk-Min Kwon, In‐Shik Han et al. · IEEE Journal of the Electron Devices Society · 2018 · 18 citations · Full text

Engineering, Fluorine Implantation Energy, Flicker Noise +16

Thermal Immune NiGermanide for High Performance Ge MOSFETs on Ge-on- Si Substrate Utilizing $ \hbox{Ni}_{0.95}\hbox{Pd}_{0.05}$ Alloy

Yingying Zhang, Jungwoo Oh, In‐Shik Han et al. · IEEE Transactions on Electron Devices · 2009 · 13 citations

Materials Science, Semiconductors, Electrical Engineering +15