S.A. Campbell - Concepedia

Author

S.A. Campbell

Also Known As

Campbell, S.A., S A Campbell, S Campbell, S. A. Campbell, S. Campbell, S.A Campbell, S.A. Campbell, S. A. Campbell, SA Campbell

Publications

804

Citations

H-Index

Concepts

All Affiliations

University of Minnesota KU Leuven University of California, Santa Barbara

About

S.A. Campbell is an author at University of Minnesota specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	14	605
2	Applied Physics	12	12	573
3	Chemistry	6	6	97
4	Natural Sciences	3	3	50
5	Chemical Engineering	1	1	16

S.A. Campbell

Publications

740

Citations

H-Index

Page 1

	Year	Citations
Internal photoemission of electrons and holes from (100)Si into HfO2 V. V. Afanas’ev, A. Stesmans, F. Chen, Applied Physics Letters EngineeringOptoelectronic DevicesSilicon On InsulatorSio2 InterlayersSemiconductor Device	2002	200
Approaching Nanoxerography: The Use of Electrostatic Forces to Position Nanoparticles with 100 nm Scale Resolution Heiko O. Jacobs, S.A. Campbell, Michael G Steward Advanced Materials	2002	135
HfO 2 -based insulating stacks on 4H–SiC(0001) V. V. Afanas’ev, A. Stesmans, F. Chen, Applied Physics Letters Materials EngineeringMaterials ScienceElectrical EngineeringSemiconductorsUltrathin Sio2/sic Interface	2003	86
Charge trapping and degradation in high-permittivity TiO<sub>2</sub> dielectric films Hyeon-Seag Kim, S.A. Campbell, C. Gilmer IEEE Electron Device Letters Materials ScienceMaterials EngineeringElectrical EngineeringCharge TrappingSuitable Replacement Materials	1997	68
Electrical and material characterizations of high-permittivity HfxTi1−xO2 gate insulators M. Li, Z. Zhang, S.A. Campbell, Journal of Applied Physics EngineeringMaterial CharacterizationsThin Film Process TechnologySemiconductor DevicePure Hfo2	2005	52
Electrical conduction and band offsets in Si/HfxTi1−xO2/metal structures V. V. Afanas’ev, A. Stesmans, F. Chen, Journal of Applied Physics Oxide HeterostructuresMaterials ScienceElectrical EngineeringSemiconductorsEngineering	2004	43
Properties of high-k/ultrahigh purity silicon nitride stacks Xiaoqing Shi, Mark A. Shriver, Z. Zhang, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceSemiconductorsHigh-k/ultrahigh Purity SiliconElectronic DevicesEngineering	2004	21
Strontium hafnate films deposited by physical vapor deposition Ivana McCarthy, Melody P. Agustin, S. Shamuilia, Thin Solid Films Materials ScienceEngineeringSurface ScienceApplied PhysicsStrontium Hafnate Films	2006	20
Impact of nitrogen incorporation on interface states in (100)Si∕HfO2 Yanina Fedorenko, Linh Truong, V. V. Afanas’ev, Journal of Applied Physics SemiconductorsOxide HeterostructuresEngineeringCrystalline DefectsSilicon On Insulator	2005	20
Fabrication and characterization of a solenoid-type microtransformer R. J. Rassel, C.F. Hiatt, J. DeCramer, IEEE Transactions on Magnetics Materials ScienceElectrical EngineeringInterleaved CoilsEngineeringMicrofabrication	2003	18

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