Miyoko Shimada

Ta penetration into template-type porous low-k material during atomic layer deposition of TaN

Akira Furuya, N. Ohtsuka, Kaori Misawa et al. · Journal of Applied Physics · 2005 · 23 citations

Engineering, Nanoporous Material, Chemistry +17

Ultrathin pore-seal film by plasma enhanced chemical vapor deposition SiCH from tetramethylsilane

Akira Furuya, Katsumi Yoneda, E. Soda et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 21 citations

Materials Science, Materials Engineering, Electrical Engineering +15

Etch-Byproduct Pore Sealing for Atomic-Layer-Deposited-TaN Deposition on Porous Low-k Film

Akira Furuya, E. Soda, Miyoko Shimada et al. · Japanese Journal of Applied Physics · 2005 · 19 citations

Engineering, Chemical Deposition, Silicon On Insulator +17

Structural Studies of High-Performance Low-k Dielectric Materials Improved by Electron-Beam Curing

Takashi Yoda, Yasushi Nakasaki, Hideki Hashimoto et al. · Japanese Journal of Applied Physics · 2005 · 18 citations

Optical Materials, X-ray Spectroscopy, Engineering +22