Concepedia

Author

Suock Chung

Hewlett-Packard (United States)

Also Known As

Su-Ock Chung, Su-Ock Chung Su-Ock Chung, Suock Chung

14

Publications

369

Citations

8

H-Index

27

Concepts

All Affiliations

Hewlett-Packard (United States)SK Group (United States)SK Group (South Korea)Gwangju Institute of Science and TechnologySeoul National University of Science and Technology
SC

About

Suock Chung is an author at Hewlett-Packard (United States) specializing in electrical engineering, engineering, and applied physics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

6

6

279

2

Electrical Engineering

6

6

279

3

Applied Physics

5

5

190

4

Computer Engineering

3

3

206

5

Materials Engineering

1

1

20

Suock Chung

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8

Publications

364

Citations

8

H-Index

YearCitations

Fully integrated 54nm STT-RAM with the smallest bit cell dimension for high density memory application

Suock Chung, K.-M. Rho, Sarim Kim,

2010

89

Ultrathin (<10nm) Nb<inf>2</inf>O<inf>5</inf>/NbO<inf>2</inf> hybrid memory with both memory and selector characteristics for high density 3D vertically stackable RRAM applications

Seonghyun Kim, Xinjun Liu, Jubong Park,

2012

80

Thickness effect of ultra-thin Ta2O5 resistance switching layer in 28 nm-diameter memory cell

Tae Hyung Park, Seul Ji Song, Hae Jin Kim,

Scientific Reports

2015

64

NbO<inf>2</inf>-based low power and cost effective 1S1R switching for high density cross point ReRAM Application

Wan Gee Kim, Hyun Min Lee, Beom Yong Kim,

2014

37

Varistor-type bidirectional switch (J<inf>MAX</inf>>10<sup>7</sup>A/cm<sup>2</sup>, selectivity∼10<sup>4</sup>) for 3D bipolar resistive memory arrays

Wootae Lee, Jubong Park, Jungho Shin,

2012

31

Effects of Electrodes on the Electric Properties of Pb(Zr,Ti)O<sub>3</sub> Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Suock Chung, Hee-Chul Lee, Won-Jong Lee Won-Jong Lee

Japanese Journal of Applied Physics

2000

22

Thickness‐dependent electroforming behavior of ultra‐thin Ta<sub>2</sub>O<sub>5</sub>resistance switching layer

Tae Hyung Park, Seul Ji Song, Hae Jin Kim,

physica status solidi (RRL) - Rapid Research Letters

2015

21

Improvement of characteristics of NbO2 selector and full integration of 4F2 2x-nm tech 1S1R ReRAM

Soo Gil Kim, Tae Jung Ha, Seonghyun Kim,

2015

20

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