Concepedia

Author

Katsuyuki Sekine

Toshiba (Japan)

Also Known As

Katsuyuki SEKINE, Katsuyuki Sekine

54

Publications

176

Citations

7

H-Index

17

Concepts

All Affiliations

Toshiba (Japan)Tohoku University
KS

About

Katsuyuki Sekine is an author at Toshiba (Japan) specializing in electrical engineering, engineering, and applied physics.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

5

5

108

2

Electrical Engineering

5

5

108

3

Applied Physics

4

4

96

4

Materials Science

2

2

69

5

Physics

2

2

27

Katsuyuki Sekine

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6

Publications

118

Citations

6

H-Index

YearCitations

Silicon nitride film growth for advanced gate dielectric at low temperature employing high-density and low-energy ion bombardment

Katsuyuki Sekine, Yuji Saito, Masaki Hirayama,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

1999

41

Low-Temperature Formation of Silicon Nitride Film by Direct Nitridation Employing High-Density and Low-Energy Ion Bombardment

Yuji Saito, Katsuyuki Sekine, Masaki Hirayama,

Japanese Journal of Applied Physics

1999

28

Effects of Nitrogen Concentration and Post-treatment on Reliability of HfSiON Gate Dielectrics in Inversion States

Motoyuki Sato, Tomonori Aoyama, Katsuyuki Sekine,

Japanese Journal of Applied Physics

2006

14

Impact of metal gate electrode on Weibull distribution of TDDB in HfSiON gate dielectrics

Izumi Hirano, Yasushi Nakasaki, Shigeto Fukatsu,

2009

13

Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing

Izumi Hirano, Yasushi Nakasaki, Shigeto Fukatsu,

Microelectronics Reliability

2013

12

Interface State in Metal–Oxide–Nitride–Silicon Memories Induced by Hole Injection during Program/Erase Cycle Stress

Shosuke Fujii, Ryota Fujitsuka, Katsuyuki Sekine,

Japanese Journal of Applied Physics

2012

10

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