Y.C. See

Titanium disilicide self-aligned source/drain + gate technology

C. K. Lau, Y.C. See, D.B. Scott et al. · 1982 · 100 citations

Engineering, Electrical Engineering, Materials Science +13

65nm CMOS high speed, general purpose and low power transistor technology for high volume foundry application

S.K.H. Fung, H.T. Huang, Sheng-Jen Cheng et al. · 2004 · 45 citations · Full text

Engineering, Electrical Engineering, Low-power Design +13

A highly manufacturable 28nm CMOS low power platform technology with fully functional 64Mb SRAM using dual/tripe gate oxide process

Shien-Yang Wu, J.J. Liaw, Chih‐Yung Lin et al. · Symposium on VLSI Technology · 2006 · 42 citations

Engineering, Computer Engineering, Electrical Engineering +17

High-performance SiGe epitaxial base bipolar transistors produced by a reduced-pressure CVD reactor

M. Hong, E. de Frésart, John Steele et al. · IEEE Electron Device Letters · 1993 · 27 citations

Engineering, Electrical Engineering, Materials Science +14

Embedded SiGe S/D PMOS on thin body SOI substrate with drive current enhancement

D. Zhang, Bich-Yen Nguyen, T. White et al. · 2005 · 24 citations

Engineering, Electrical Engineering, Materials Science +14