C. K. Lau

Titanium disilicide self-aligned source/drain + gate technology

C. K. Lau, Y.C. See, D.B. Scott et al. · 1982 · 100 citations

Materials Engineering, Electrical Engineering, Scaled Cmos Devices +10

Finite element analysis on the effect of workpiece geometry on the quenching of ST50 steel

A.M.S. Hamouda, S. Sulaiman, C. K. Lau · Journal of Materials Processing Technology · 2001 · 21 citations

Engineering, Finite Element Analysis, Cold-formed Section +10

Process‐Induced Gate Oxide Charge Collector Damage

W. Greene, C. K. Lau · Journal of The Electrochemical Society · 1992 · 15 citations

Electrical Engineering, Engineering, Charge Strike +9

Parasitic capacitance characteristics of deep submicrometre grooved gate MOSFETs

S. Sreelal, C. K. Lau, Ganesh S. Samudra · Semiconductor Science and Technology · 2002 · 15 citations

Device Modeling, Grooved Gate Devices, Electrical Engineering +9

Submicrometer thin gate oxide P-channel transistors with P⁺polysilicon gates for VLSI applications

Kit Man Cham, D. W. Wenocur, Jane Lin et al. · IEEE Electron Device Letters · 1986 · 12 citations

Electrical Engineering, Electronic Devices, P+ Poly +15