Concepedia

Dimitra Niakoula

DN

9

Publications

222

Citations

9

H-Index

2006

Active since

Affiliations

Lawrence Berkeley National Laboratory(Current)

National Centre of Scientific Research "Demokritos"

Samsung (South Korea)

Advanced Micro Devices (United States)

University at Albany, State University of New York

Dimitra Niakoula is an author at Lawrence Berkeley National Laboratory specializing in engineering, applied physics, and optical properties.

Top concepts

Publications per year

2006–2009

9

Publications

9

Resolution, LER, and sensitivity limitations of photoresists

Gregg M. Gallatin, Patrick Naulleau, Dimitra Niakoula et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 48 citations

, , +11

System-level line-edge roughness limits in extreme ultraviolet lithography

Patrick Naulleau, Dimitra Niakoula, Guojing Zhang · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 39 citations

, , +14

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu et al. · Microelectronic Engineering · 2009 · 31 citations

, , +11

Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography

Antonios M. Douvas, Frieda Van Roey, M. Goethals et al. · Chemistry of Materials · 2006 · 24 citations

, , +17

Film quantum yields of EUV and ultra-high PAG photoresists

Elsayed Hassanein, Craig Higgins, Patrick Naulleau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 22 citations

, , +18

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