Concepedia

Masami Nakata

MN

13

Publications

467

Citations

11

H-Index

1989

Active since

Affiliations

Tokyo Institute of Technology(Current)

Hitachi (Japan)

Princeton University

Masami Nakata is an author at Tokyo Institute of Technology specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceThin FilmsSurface ScienceChemistryMicroelectronicsElectrical EngineeringMaterials EngineeringPhysics

Publications per year

1989–2023

13

Publications

13

UV-O/sub 3/ and dry-O/sub 2/: Two-step-annealed chemical vapor-deposited Ta/sub 2/O/sub 5/ films for storage dielectrics of 64-Mb DRAMs

H. Shinriki, Masami Nakata · IEEE Transactions on Electron Devices · 1991 · 205 citations

Engineering, Vacuum Device, Photovoltaics +16

Preparation of High-Quality Microcrystalline Silicon from Fluorinated Precursors by a Layer-by-Layer Technique

Shun-ichi Ishihara, Deyan He, Masami Nakata et al. · Japanese Journal of Applied Physics · 1993 · 49 citations

Fluorinated Precursors Sih, Engineering, High-quality Microcrystalline Silicon +18

Two-step annealing technique for leakage current reduction in chemical-vapor-deposited Ta/sub 2/O/sub 5/ film

H. Shinriki, Masami Nakata, Yasushiro Nishioka et al. · IEEE Electron Device Letters · 1989 · 43 citations

Engineering, Integrated Circuits, Thin Film Process Technology +17

Control of nucleation and growth in the preparation of crystals by plasma-enhanced chemical vapour deposition

Masami Nakata, Akira Sakai, Takuya Uematsu et al. · Philosophical Magazine B · 1991 · 34 citations

Engineering, Crystal Growth Technology, Atomie Hydrogen +16

Fast growth of hydrogenated amorphous silicon from dichlorosilane

Masami Nakata, S. Wagner · Applied Physics Letters · 1994 · 27 citations

Materials Science, Semiconductors, Fast Growth +15

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