Concepedia

Shun-ichi Ishihara

SI

4

Publications

132

Citations

4

H-Index

1986

Active since

Affiliations

Tokyo Institute of Technology(Current)

Shun-ichi Ishihara is an author at Tokyo Institute of Technology specializing in materials science, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMaterial ScienceMaterials EngineeringChemistryThin FilmsMicrostructureMicroelectronicsMicrofabrication

Publications per year

1986–1994

4

Publications

4

Preparation of High-Quality Microcrystalline Silicon from Fluorinated Precursors by a Layer-by-Layer Technique

Shun-ichi Ishihara, Deyan He, Masami Nakata et al. · Japanese Journal of Applied Physics · 1993 · 49 citations

Fluorinated Precursors Sih, Engineering, High-quality Microcrystalline Silicon +18

The Role of Hydrogen Radicals in the Growth of a-Si and Related Alloys

Shunri Oda, Shun-ichi Ishihara, Naoki Shibata et al. · Japanese Journal of Applied Physics · 1986 · 37 citations

Sif N Radicals, Engineering, Chemistry +18

Structure of Polycrystalline Silicon Thin Film Fabricated from Fluorinated Precursors by Layer-by-Layer Technique

Shun-ichi Ishihara, Deyan He, Isamu Shimizu · Japanese Journal of Applied Physics · 1994 · 32 citations

Engineering, Silicon On Insulator, Chemical Engineering +16

Structural and Electrical Properties of n-Type Poly-Si Films Prepared by Layer-by-Layer Technique

Deyan He, Shun-ichi Ishihara, Isamu Shimizu · Japanese Journal of Applied Physics · 1993 · 14 citations

Engineering, Optoelectronic Devices, Chemistry +25

Rows per page

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