Minoru Toriumi

Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 53 citations

Engineering, Electrical Engineering, Materials Science +16

Measurements of binary diffusion coefficients for metal complexes in organic solvents by the Taylor dispersion method

Minoru Toriumi, Ryohei Katooka, Kazuko Yui et al. · Fluid Phase Equilibria · 2010 · 36 citations

Natural Sciences, Chemistry, Analytical Chemistry +16

Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan et al. · Japanese Journal of Applied Physics · 2008 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +13

Swelling Analysis of Methacrylate Polymers in Aqueous Alkaline Developer

Minoru Toriumi, Takeshi Ohfuji, Masayuki Endo et al. · Journal of Photopolymer Science and Technology · 1999 · 30 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +14

Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

S. Kodama, Isamu Kaneko, Yoko Takebe et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 30 citations

Natural Sciences, Chemistry, Materials Science +17