Takeshi Ohfuji

Swelling Analysis of Methacrylate Polymers in Aqueous Alkaline Developer

Minoru Toriumi, Takeshi Ohfuji, Masayuki Endo et al. · Journal of Photopolymer Science and Technology · 1999 · 30 citations · Full text

Materials Science, Engineering, Dissolution Rate +11

<title>Positive chemically amplified resist for ArF excimer laser lithography composed of a novel transparent photoacid generator and an alicyclic terpolymer</title>

Kaichiro Nakano, Katsumi Maeda, Shigeyuki Iwasa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 27 citations

High Thermal Stability, Optical Materials, Engineering +17

Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists.

Shigeyuki Iwasa, Katsumi Maeda, Kaichiro Nakano et al. · Journal of Photopolymer Science and Technology · 1996 · 21 citations · Full text

Engineering, Dissolution Rates, Organic Chemistry +18

Novel Resist Materials Using Acid Amplifiers. Part II.

Soh Noguchi, Koji Arimitsu, Kunihiro Ichimura et al. · Journal of Photopolymer Science and Technology · 1997 · 18 citations · Full text

Materials Engineering, Materials Science, Engineering +5

Novel alkaline-soluble alicyclic polymer poly(TCDMACOOH) for ArF chemically amplified positive resists

Katsumi Maeda, Kaichiro Nakano, Takeshi Ohfuji et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 16 citations

Engineering, Responsive Polymers, Chemistry +17