Concepedia

Julius Joseph Santillan

JJ

28

Publications

715

Citations

16

H-Index

2007

Active since

Affiliations

The University of Osaka(Current)

Evolving Nano Process Infrastructure Development Center (Japan)

Osaka Research Institute of Industrial Science and Technology

Edge Technologies (United States)

SCREEN (Japan)

Julius Joseph Santillan is an author at The University of Osaka specializing in applied physics, engineering, and microelectronics.

ORCID

Top concepts

Publications per year

2007–2022

28

Publications

28

Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani · Applied Physics Express · 2013 · 84 citations

, , +21

Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani · Japanese Journal of Applied Physics · 2013 · 57 citations

, , +16

Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography

Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 53 citations

, , +16

<i>In situ</i>Characterization of Photoresist Dissolution

Toshiro Itani, Julius Joseph Santillan · Applied Physics Express · 2010 · 47 citations

, , +16

Alternative developer solutions for extreme ultraviolet resist

Toshiro Itani, Julius Joseph Santillan · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 46 citations

, , +12

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