S. A. Cohen

Transient boron diffusion in ion-implanted crystalline and amorphous silicon

T. O. Sedgwick, A. E. Michel, V. R. Deline et al. · Journal of Applied Physics · 1988 · 174 citations

Engineering, Materials Engineering, Materials Science +17

Gate oxide breakdown under Current Limited Constant Voltage Stress

B.P. Linder, J. H. Stathis, R. Wachnik et al. · 2002 · 83 citations

Engineering, Electrical Engineering, Circuit Theory +15

n-butyrate reduces the expression of beta-galactoside alpha 2,6-sialyltransferase in Hep G2 cells.

Shrushti Shah, Peter Lance, Terry J. Smith et al. · Journal of Biological Chemistry · 1992 · 56 citations · Full text

Life Sciences, Biochemistry, Molecular Biology +17

Diffusion of phosphorus during rapid thermal annealing of ion-implanted silicon

G. S. Oehrlein, S. A. Cohen, T. O. Sedgwick · Applied Physics Letters · 1984 · 56 citations

Engineering, Materials Engineering, Materials Science +17

Property modifications of nanoporous pSiCOH dielectrics to enhance resistance to plasma-induced damage

E. Todd Ryan, S. M. Gates, A. Grill et al. · Journal of Applied Physics · 2008 · 54 citations

Natural Sciences, Materials Engineering, Materials Science +17