Concepedia

T. O. Sedgwick

TO

Statistics

Publications

51

Citations

1.7K

H-Index

23

Active since

1964

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

IBM (United States)

T. O. Sedgwick is an author at IBM Research - Thomas J. Watson Research Center specializing in materials science, materials engineering, and electronic materials.

Publications per year

1964–1998

51

Publications

51

Transient boron diffusion in ion-implanted crystalline and amorphous silicon

T. O. Sedgwick, A. E. Michel, V. R. Deline et al. · Journal of Applied Physics · 1988 · 174 citations

, , +17

Chemical Vapor Deposited Polycrystalline Silicon

M. E. Cowher, T. O. Sedgwick · Journal of The Electrochemical Society · 1972 · 174 citations · Full text

, , +17

Short Time Annealing

T. O. Sedgwick · Journal of The Electrochemical Society · 1983 · 147 citations

, , +17

Low-temperature selective epitaxial growth of silicon at atmospheric pressure

T. O. Sedgwick, M. Berkenblit, T. S. Kuan · Applied Physics Letters · 1989 · 91 citations

, , +16

Transient enhanced diffusion in arsenic-implanted short time annealed silicon

R. Kalish, T. O. Sedgwick, Sebastian Mäder et al. · Applied Physics Letters · 1984 · 70 citations

, , +16

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