Senajith Rekawa

Demonstration of 12 nm Resolution Fresnel Zone Plate Lens based Soft X-ray Microscopy

Weilun Chao, Jihoon Kim, Senajith Rekawa et al. · Optics Express · 2009 · 277 citations · Full text

Engineering, Microscopy, Double Patterning Technique +18

Hartmann wave-front measurement at 134 nm with λ_EUV/120 accuracy

Pascal Mercère, Philippe Zeitoun, Mourad Idir et al. · Optics Letters · 2003 · 92 citations

Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Patrick Naulleau, Kenneth A. Goldberg, Phil Batson et al. · Applied Optics · 2003 · 45 citations

Photonics, Extreme Ultraviolet Lithography, Engineering +13

Commissioning an EUV mask microscope for lithography generations reaching 8 nm

Kenneth A. Goldberg, Iacopo Mochi, Markus P. Benk et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 45 citations · Full text

At-wavelength alignment and testing of the 0.3 NA MET optic

Kenneth A. Goldberg, Patrick Naulleau, Paul Denham et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 33 citations

Short Wavelength Optic, Optical Materials, Engineering +27