Seno Rekawa

Critical challenges for EUV resist materials

Patrick Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 63 citations

Engineering, Electrical Engineering, Materials Science +13

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 38 citations

Natural Sciences, Electrical Engineering, Microfabrication +11

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

Patrick Naulleau, Kenneth A. Goldberg, Erik Anderson et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 36 citations

Engineering, Manufacturing Engineering, Materials Engineering +10

At-wavelength detection of extreme ultraviolet lithography mask blank defects

Seongtae Jeong, Mourad Idir, Yun Lin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 18 citations

Engineering, Electrical Engineering, Optics +11

Actinic detection of sub-100 nm defects on extreme ultraviolet lithography mask blanks

Seongtae Jeong, Lewis Johnson, Seno Rekawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +14