T. H. Fedynyshyn

Review of technology for 157-nm lithography

A. K. Bates, M. Rothschild, T. M. Bloomstein et al. · IBM Journal of Research and Development · 2001 · 60 citations

Materials Science, Materials Engineering, Critical Issues +14

Effect of acid diffusion on performance in positive deep ultraviolet resists

T. H. Fedynyshyn, James W. Thackeray, Jacque H. Georger et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 56 citations

Materials Science, Chemical Kinetics, Engineering +12

157 nm: Deepest deep-ultraviolet yet

M. Rothschild, T. M. Bloomstein, Jane E. Curtin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 48 citations

Ultraviolet Light, Short Wavelength Optic, Optical Materials +23

Effect of surface roughness and H–termination chemistry on diamond's semiconducting surface conductance

Travis C. Wade, M. W. Geis, T. H. Fedynyshyn et al. · Diamond and Related Materials · 2017 · 46 citations

Materials Science, Surface Characterization, Diamond-like Carbon +9

Nanopatterning with UV Optical Lithography

M. Rothschild, T. M. Bloomstein, N. N. Efremow et al. · MRS Bulletin · 2005 · 35 citations

Materials Science, Engineering, Electron-beam Lithography +9