Guanyang Lin

The Limits of Lamellae-Forming PS-<i>b</i>-PMMA Block Copolymers for Lithography

Lei Wan, Ricardo Ruiz, He Gao et al. · ACS Nano · 2015 · 154 citations

Engineering, Materials Engineering, Materials Science +17

Implementation of templated DSA for via layer patterning at the 7nm node

Roel Gronheid, Jan Doise, Joost Bekaert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 114 citations

Engineering, Materials Engineering, Materials Science +17

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Roel Gronheid, Paulina Rincon Delgadillo, Hari Pathangi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 51 citations

Natural Sciences, Materials Engineering, Materials Science +15

The SMARTTM Process for Directed Block Co-Polymer Self-Assembly

Jihoon Kim, Jingxiu Wan, Shinji Miyazaki et al. · Journal of Photopolymer Science and Technology · 2013 · 43 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2015 · 38 citations

Natural Sciences, Materials Engineering, Materials Science +17