S. V. Babu

Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions

Naresh K. Penta, B. Peethala, H. P. Amanapu et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 2013 · 45 citations

Materials Science, Molecular Sieve, Chemical Engineering +10

Fundamental Investigation of Chemical Mechanical Polishing of GaAs in Silica Dispersions: Material Removal and Arsenic Trihydride Formation Pathways

John B. Matovu, Patrick Ong, Leonardus H. A. Leunissen et al. · ECS Journal of Solid State Science and Technology · 2013 · 38 citations

Materials Science, Materials Engineering, Chemical Engineering +15

Use of Multifunctional Carboxylic Acids and Hydrogen Peroxide To Improve Surface Quality and Minimize Phosphine Evolution During Chemical Mechanical Polishing of Indium Phosphide Surfaces

John B. Matovu, Patrick Ong, Leonardus H. A. Leunissen et al. · Industrial & Engineering Chemistry Research · 2013 · 31 citations

Engineering, Chemistry, Mineral Processing +19

Chemical Mechanical Polishing of Ge Using Colloidal Silica Particles and H₂O₂

Shivaji Peddeti, Patrick Ong, Leonardus H. A. Leunissen et al. · Electrochemical and Solid-State Letters · 2011 · 29 citations

Engineering, Mechanical Engineering, Germanium Hydroxides +21

Chemical Mechanical Polishing of InP

Shivaji Peddeti, Patrick Ong, Leonardus H. A. Leunissen et al. · ECS Journal of Solid State Science and Technology · 2012 · 26 citations

Engineering, Mechanical Engineering, Chemistry +17