Naresh K. Penta

Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions

Naresh K. Penta, B. Peethala, H. P. Amanapu et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 2013 · 46 citations

Natural Sciences, Chemistry, Materials Science +17

Use of anionic surfactants for selective polishing of silicon dioxide over silicon nitride films using colloidal silica-based slurries

Naresh K. Penta, H. P. Amanapu, B. Peethala et al. · Applied Surface Science · 2013 · 38 citations

Engineering, Chemistry, Materials Science +17

Role of Poly(diallyldimethylammonium chloride) in Selective Polishing of Polysilicon over Silicon Dioxide and Silicon Nitride Films

Naresh K. Penta, P. R. Dandu Veera, S. V. Babu · Langmuir · 2011 · 33 citations

Engineering, Materials Engineering, Materials Science +17

Chemical Mechanical Polishing of Ge in Hydrogen Peroxide-Based Silica Slurries: Role of Ionic Strength

John B. Matovu, Naresh K. Penta, Shivaji Peddeti et al. · Journal of The Electrochemical Society · 2011 · 27 citations

Engineering, Chemical Engineering, Environmental Engineering +13

Charge Density and pH Effects on Polycation Adsorption on Poly-Si, SiO₂, and Si₃N₄Films and Impact on Removal During Chemical Mechanical Polishing

Naresh K. Penta, P. R. Dandu Veera, S. V. Babu · ACS Applied Materials & Interfaces · 2011 · 27 citations

Natural Sciences, Chemistry, Materials Science +17