H. P. Amanapu

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Ruijie Xie, P. Montanini, Kerem Akarvardar et al. · 2016 · 144 citations

Engineering, Electrical Engineering, Materials Science +15

Cobalt Polishing with Reduced Galvanic Corrosion at Copper/Cobalt Interface Using Hydrogen Peroxide as an Oxidizer in Colloidal Silica-Based Slurries

B. Peethala, H. P. Amanapu, Uma Rames Krishna Lagudu et al. · Journal of The Electrochemical Society · 2012 · 90 citations

Natural Sciences, Materials Engineering, Materials Science +17

Citric Acid as a Complexing Agent in Chemical Mechanical Polishing Slurries for Cobalt Films for Interconnect Applications

R. Popuri, K. V. Sagi, S. R. Alety et al. · ECS Journal of Solid State Science and Technology · 2017 · 76 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Potassium Oleate as a Dissolution and Corrosion Inhibitor during Chemical Mechanical Planarization of Chemical Vapor Deposited Co Films for Interconnect Applications

R. Popuri, H. P. Amanapu, C. K. Ranaweera et al. · ECS Journal of Solid State Science and Technology · 2017 · 58 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Investigation of Percarbonate Based Slurry Chemistry for Controlling Galvanic Corrosion during CMP of Ruthenium

Michael Türk, S.E. Rock, H. P. Amanapu et al. · ECS Journal of Solid State Science and Technology · 2013 · 56 citations

Natural Sciences, Materials Engineering, Materials Science +17