M. Torkler

Statistics

Publications

Citations

154

H-Index

Active since

1994

Affiliations

Fraunhofer Institute for Silicon Technology(Current)

IMS Nanofabrication (Austria)

University of Applied Sciences Technikum Wien

M. Torkler is an author at Fraunhofer Institute for Silicon Technology specializing in materials science, thin film lithography, and microfabrication.

Publications per year

1994–2002

Publications

Measuring acid generation efficiency in chemically amplified resists with all three beams

Charles R. Szmanda, Robert L. Brainard, Joseph F. Mackevich et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 46 citations

Medicine, Chemistry, Radiation Dosimetry +11

Nanocomposite resist systems for next generation lithography

Lhadi Merhari, Kenneth E. Gonsalves, Yue Hu et al. · Microelectronic Engineering · 2002 · 37 citations

Natural Sciences, Materials Engineering, Materials Science +13

Modeling of edge roughness in ion projection lithography

Wolfgang Henke, M. Torkler · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 23 citations · Full text

Engineering, Electrical Engineering, Materials Science +15

Resolution improvement of ion projector with a low energy spread multicusp ion source

W.H. Bruenger, M. Torkler, K. N. Leung et al. · Microelectronic Engineering · 1999 · 18 citations

Engineering, Nuclear Engineering, Physics +8

Experimental investigation of stochastic space charge effects on pattern resolution in ion projection lithography systems

E. Hammel, A. Chalupka, J. Fegerl et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 16 citations

Engineering, Physics, Microelectromechanical Systems +10

1–5 of 6