Jaime Morillo

A 14 nm Embedded STT-MRAM CMOS Technology

D. Edelstein, Michael Rizzolo, Devika Sil et al. · 2020 · 58 citations

Engineering, Computer Engineering, Electrical Engineering +16

New paradigm in lens metrology for lithographic scanner: evaluation and exploration

Kafai Lai, Gregg M. Gallatin, Mark van de Kerkhof et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 24 citations

Natural Sciences, Physics, Metrology +13

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Kafai Lai, Chi‐Chun Liu, Hsinyu Tsai et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 15 citations

Engineering, Computer Engineering, Manufacturing Engineering +17

Edge and bevel automated defect inspection for 300mm production wafers in manufacturing

Jaime Morillo, T. Houghton, Joseph Bauer et al. · 2005 · 13 citations

Engineering, Industrial Engineering, Manufacturing Engineering +14

Blossom overlay metrology implementation

Christopher P. Ausschnitt, W. H. Chu, D. Kolor et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 13 citations

Engineering, Manufacturing Engineering, Manufacturing Processes +12