Statistics
Publications
4
Citations
163
H-Index
4
Active since
2003
Stacy Rasgon is an author at Massachusetts Institute of Technology specializing in materials science, etching processes, and natural sciences.
Publications per year
2003–2006
4
4
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
Darı́o L. Goldfarb, Arpan P. Mahorowala, Gregg M. Gallatin et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 86 citations
Natural Sciences, Materials Engineering, Materials Science +17
Line edge roughness reduction by plasma curing photoresists
Arpan P. Mahorowala, Kuang‐Jung Chen, Ratnam Sooriyakumaran et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 41 citations
Natural Sciences, Electrical Engineering, Materials Science +16
Investigation of surface roughening of low-k films during etching using fluorocarbon plasma beams
Yunpeng Yin, Stacy Rasgon, Herbert H. Sawin · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 23 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +17
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