O. Salicio

Effects of Thermal Treatments on the Trapping Properties of HfO$_{2}$ Films for Charge Trap Memories

Sabina Spiga, F. Driussi, Alessio Lamperti et al. · Applied Physics Express · 2012 · 57 citations

Dielectric properties of Er−doped HfO2 (Er∼15%) grown by atomic layer deposition for high-κ gate stacks

Claudia Wiemer, L. Lamagna, S. Baldovino et al. · Applied Physics Letters · 2010 · 39 citations · Full text

Materials Science, Oxide Heterostructures, Electrical Engineering +15

Hot-Wire Chemical Vapor Deposition of Chalcogenide Materials for Phase Change Memory Applications

A. Abrutis, Valentina Plaušinaitienė, Martynas Skapas et al. · Chemistry of Materials · 2008 · 37 citations

Engineering, Chemical Deposition, Phase Change Memory +16

Area selective deposition of TiO2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme

R. Vallat, R. Gassilloud, O. Salicio et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 36 citations · Full text

Integration Scheme, Engineering, Peald Process +23

Metal Organic Chemical Vapor Deposition of Phase Change Ge₁Sb₂Te₄Nanowires

Massimo Longo, Roberto Fallica, Claudia Wiemer et al. · Nano Letters · 2012 · 35 citations