Ozone-Based Atomic Layer Deposition of Alumina from TMA:  Growth, Morphology, and Reaction Mechanism

Simon D. Elliott, G. Scarel, Claudia Wiemer, +2

Chemistry of Materials

Materials ScienceAluminium NitrideGrowth TemperatureEngineeringOxidation Resistance +10

Conductive-filament switching analysis and self-accelerated thermal dissolution model for reset in NiO-based RRAM

Ugo Russo, Daniele Ielmini, C. Cagli, +5

Non-volatile MemoryEngineeringNio-based RramConductive-filament Switching AnalysisReset Operation +14

Electronic states and mechanical properties in transition metal nitrides

F. Lévy, P. Hones, P. E. Schmid, +3

Surface and Coatings Technology

Materials ScienceEngineeringCubic Boron NitrideApplied PhysicsCondensed Matter Physics +1

Amorphization dynamics of Ge2Sb2Te5 films upon nano- and femtosecond laser pulse irradiation

Jan Siegel, Daniel Puerto, Carlos Dorronsoro, +5

Journal of Applied Physics

Transient GratingOptical MaterialsEngineeringCrystal Growth TechnologyGe2sb2te5 Films +17

Atomic-layer deposition of Lu2O3

G. Scarel, Emiliano Bonera, Claudia Wiemer, +7

Applied Physics Letters

Materials ScienceMaterials EngineeringOxide HeterostructuresSemiconductorsDielectric Constant +13

Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, +57

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

EngineeringThin Film Process TechnologyChemistryChemical DepositionSurface Technology +15

Valence band photoemission study of the TiMoN system

R. Sanjinés, Claudia Wiemer, J. Almeida, +1

Thin Solid Films

Thermal characterization of the SiO2-Ge2Sb2Te5 interface from room temperature up to 400°C

Jean‐Luc Battaglia, Andrzej Kusiak, Vincent Schick, +4

Journal of Applied Physics

Materials ScienceRoom TemperatureHigh Temperature MaterialsEngineeringCrystalline Defects +12

Combining grazing incidence X-ray diffraction and X-ray reflectivity for the evaluation of the structural evolution of HfO2 thin films with annealing

Claudia Wiemer, S. Ferrari, M. Fanciulli, +2

Thin Solid Films

Materials ScienceIncidence X-ray DiffractionMaterial AnalysisEngineeringSurface Science +8

High Temperature Thermal Conductivity of Amorphous Al₂<scp>O</scp>₃ Thin Films Grown by Low Temperature ALD

Andréa Cappella, Jean‐Luc Battaglia, Vincent Schick, +4

Advanced Engineering Materials

Materials ScienceThin Film PhysicsEngineeringCrystalline DefectsO 3 +13