R. Gassilloud

Deformation mechanisms of silicon during nanoscratching

R. Gassilloud, Christophe Ballif, Ph. Gasser et al. · physica status solidi (a) · 2005 · 117 citations · Full text

Dislocation Nucleation, Engineering, Severe Plastic Deformation +20

3D Sequential Integration: Application-driven technological achievements and guidelines

P. Batude, Laurent Brunet, C. Fenouillet-Béranger et al. · 2017 · 73 citations

Contact Pitch, Engineering, 3D Modeling +26

Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps

R. Vallat, R. Gassilloud, Brice Eychenne et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 62 citations · Full text

Engineering, Selective Deposition, Chemical Deposition +18

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

C. Vallée, M. Bonvalot, S. Belahcen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2020 · 56 citations · Full text

Engineering, Chemistry, Chemical Deposition +16

Cleavage Fracture of Brittle Semiconductors from the Nanometre to the Centimetre Scale

Kilian Wasmer, Christophe Ballif, R. Gassilloud et al. · Advanced Engineering Materials · 2005 · 54 citations · Full text

Cleavage Fracture, Engineering, Brittle Semiconductors +20