M. Bonvalot

Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition

Christophe Durand, C. Dubourdieu, C. Vallée et al. · Journal of Applied Physics · 2004 · 65 citations · Full text

Materials Science, Electrical Engineering, Chemical Engineering +15

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

C. Vallée, M. Bonvalot, S. Belahcen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2020 · 56 citations · Full text

Engineering, Chemistry, Chemical Deposition +16

Structural and Electrical Characterizations of Yttrium Oxide Films after Postannealing Treatments

Christophe Durand, C. Dubourdieu, C. Vallée et al. · Journal of The Electrochemical Society · 2005 · 39 citations

Physicochemical and electrical characterizations of atomic layer deposition grown HfO2 on TiN and Pt for metal-insulator-metal application

Corentin Jorel, C. Vallée, E. Gourvest et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 38 citations · Full text

Engineering, Electrode-electrolyte Interface, Electrical Characterizations +20

Metal–insulator–metal capacitors using Y2O3 dielectric grown by pulsed-injection plasma enhanced metalorganic chemical vapor deposition

Christophe Durand, C. Vallée, V. Loup et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 35 citations

Engineering, Pulsed-injection Plasma, Integrated Circuits +16