Aron Cepler

Gaps analysis for CD metrology beyond the 22nm node

Benjamin Bunday, Thomas A. Germer, Victor Vartanian et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 72 citations

Engineering, Microscopy, Measurement +19

Fabrication of Zr–N codoped p-type ZnO thin films by pulsed laser deposition

Heungsoo Kim, Aron Cepler, M. S. Osofsky et al. · Applied Physics Letters · 2007 · 38 citations

Materials Science, Semiconductors, Ii-vi Semiconductor +13

CD-SEM metrology for sub-10nm width features

Benjamin Bunday, Aron Cepler, Aaron Cordes et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 29 citations

Cd-sem Metrology, Engineering, Electron-beam Lithography +20

In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Eric Solecky, Oliver D. Patterson, Andrew Stamper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 27 citations

Engineering, Electron-beam Lithography, Measurement +21

Scanning electron microscopy imaging of ultra-high aspect ratio hole features

Aron Cepler, Benjamin Bunday, Bradley L. Thiel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 16 citations

Engineering, Electron-beam Lithography, Microscopy +16