Maayan Bar-Zvi

Phenomenology of electron-beam-induced photoresist shrinkage trends

Benjamin Bunday, Aaron Cordes, John A. Allgair et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 24 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Characterization of CD-SEM metrology for iArF photoresist materials

Benjamin Bunday, Aaron Cordes, Ndubuisi G. Orji et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 23 citations

Engineering, Electrical Engineering, Materials Engineering +13

The coming of age of tilt CD-SEM

Benjamin Bunday, John A. Allgair, Eric Solecky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 14 citations

Engineering, Electrical Engineering, Metrology +15

Solving next generation (1x node) metrology challenges using advanced CDSEM capabilities: tilt, high energy and backscatter imaging

Xiaoxiao Zhang, Patrick Snow, Alok Vaid et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 13 citations

Engineering, Electrical Engineering, Materials Science +17

Addressing FinFET metrology challenges in 1× node using tilt-beam critical dimension scanning electron microscope

Xiaoxiao Zhang, Hua Zhou, Zhen‐Hua Ge et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2014 · 13 citations

Engineering, Electrical Engineering, Materials Science +17