Yu. N. Erokhin

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Active since

1990

Affiliations

Institute of Microelectronics Technology and High Purity Materials(Current)

North Carolina State University

Yu. N. Erokhin is an author at Institute of Microelectronics Technology and High Purity Materials specializing in materials engineering, engineering, and materials science.

Publications per year

1990–2004

Publications

Spatially confined nickel disilicide formation at 400 °C on ion implantation preamorphized silicon

Yu. N. Erokhin, Feng Hong, S. Pramanick et al. · Applied Physics Letters · 1993 · 18 citations

Engineering, Materials Engineering, Materials Science +17

Morphological instability and Si diffusion in nanoscale cobalt silicide films formed on heavily phosphorus doped polycrystalline silicon

S. Pramanick, Yu. N. Erokhin, B.K. Patnaik et al. · Applied Physics Letters · 1993 · 17 citations

Engineering, Materials Engineering, Materials Science +17

Mesotaxy by nickel diffusion into a buried amorphous silicon layer

Yu. N. Erokhin, R. Grötzschel, S. Oktyabrsky et al. · Materials Science and Engineering B · 1992 · 14 citations

Engineering, Materials Engineering, Materials Science +7

Possibilities of X-Ray Interfernce Diffractometry for the Investigation of Ion-Doped Layers

V. V. Aristov, V.N. Mordkovich, A. Yu. Nikulin et al. · physica status solidi (a) · 1990 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +11

Ultra-low cost and high performance 65nm CMOS device fabricated with plasma doping

F. Lallement, B. Duriez, A. Grouillet et al. · 2004 · 11 citations

Engineering, Computer Engineering, Electrical Engineering +17

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