John Holland - Concepedia

Author

John Holland

Also Known As

Holland, John, J P Holland, J. Holland, J. P. HOLLAND, J. P. Holland, J.P. Holland, John Holland, John P Holland, John P. Holland

Publications

1.1K

Citations

H-Index

Concepts

All Affiliations

Applied Materials (United States)Scotland's Rural College Lam Research (United States)New Mexico State University University of California, Davis

About

John Holland is an author at Applied Materials (United States) specializing in engineering, applied physics, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	15	17	790
2	Social Sciences	6	6	160
3	Public Health	5	5	128
4	Natural Sciences	2	2	50
5	Business	1	1	27

John Holland

Publications

993

Citations

H-Index

Page 1

	Year	Citations
A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments Mark J. Kushner, Wenli Collison, Michael Grapperhaus, Journal of Applied Physics Electrical EngineeringIcp ReactorEngineeringThree-dimensional ModelPhysics	1996	112
Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber Gregory A. Hebner, Edward V. Barnat, Paul Miller, Plasma Sources Science and Technology Electrical EngineeringLine-integrated Electron DensityEngineeringArgon Metastable DensityApplied Physics	2006	90
An automated sensor-based method of simple behavioural classification of sheep in extensive systems Christina Umstätter, A. Waterhouse, John Holland Computers and Electronics in Agriculture Automated Sensor-based MethodEngineeringIntelligent SensorData SciencePattern Recognition	2008	84
Transformer coupled plasma etch technology for the fabrication of subhalf micron structures J. B. Carter, John Holland, Eric A. Peltzer, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceElectrical EngineeringSubhalf Micron StructuresEngineeringPlasma Etch Technology	1993	66
Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor Paul Miller, Edward V. Barnat, Gregory A. Hebner, Plasma Sources Science and Technology Electrical EngineeringPlasma ReactorEngineeringRf FieldsPhysics	2006	66
Characteristics and mechanism of etch process sensitivity to chamber surface condition Songlin Xu, Zhiwen Sun, Xueyu Qian, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringBr DensitiesPlasma ProcessingChamber SurfaceHigh Density	2001	66
Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles Yiting Zhang, Mark J. Kushner, Saravanapriyan Sriraman, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringPlasma SciencePlasma PhysicsEtch ProfilesPlasma Processing	2015	55
Impacts of livestock in regenerating upland birch woodlands in Scotland M. L. Pollock, Jos M. Milner, A. Waterhouse, Biological Conservation Upland Birch WoodlandsSilvicultureLand UseForest RestorationForest Conservation	2005	41
The impact of frequency mixing on sheath properties: Ion energy distribution and Vdc∕Vrf interaction Steven Shannon, D. J. Hoffman, Jang-Gyoo Yang, Journal of Applied Physics Dc Sheath PotentialEngineeringRadio FrequencyDefined Electron DensityNonlinear Sheath	2005	40
Beef Production in the Southwestern United States: Strategies Toward Sustainability Sheri Spiegal, Andrés F. Cibils, Brandon T. Bestelmeyer, Frontiers in Sustainable Food Systems Precision AgricultureRangeland ProductivityLand UseAgricultural EconomicsLivestock Production	2020	34

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