John Holland

A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments

Mark J. Kushner, Wenli Collison, Michael Grapperhaus et al. · Journal of Applied Physics · 1996 · 112 citations

Electrical Engineering, Icp Reactor, Engineering +13

Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber

Gregory A. Hebner, Edward V. Barnat, Paul Miller et al. · Plasma Sources Science and Technology · 2006 · 90 citations

Electrical Engineering, Line-integrated Electron Density, Engineering +9

An automated sensor-based method of simple behavioural classification of sheep in extensive systems

Christina Umstätter, A. Waterhouse, John Holland · Computers and Electronics in Agriculture · 2008 · 84 citations

Automated Sensor-based Method, Engineering, Intelligent Sensor +7

Transformer coupled plasma etch technology for the fabrication of subhalf micron structures

J. B. Carter, John Holland, Eric A. Peltzer et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 66 citations

Materials Science, Electrical Engineering, Subhalf Micron Structures +14

Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor

Paul Miller, Edward V. Barnat, Gregory A. Hebner et al. · Plasma Sources Science and Technology · 2006 · 66 citations

Electrical Engineering, Plasma Reactor, Engineering +14