Mark Lawliss

Through-focus EUV multilayer defect repair with nanomachining

Gregory McIntyre, Emily Gallagher, Tod Robinson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 16 citations

Engineering, Electron-beam Lithography, Microscopy +18

EUV photomask defects: what prints, what doesn't, and what is required for HVM

Jed Rankin, Zhengqing John Qi, Mark Lawliss et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 12 citations

Repairing native defects on EUV mask blanks

Mark Lawliss, Emily Gallagher, M. Hibbs et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 12 citations

Materials Science, Native Defects, Engineering +15

Overlay enhancement with product-specific emulation in electron-beam lithography tools

Denise M. Puisto, M. A. Sturans, Mark Lawliss · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 11 citations

Engineering, Electron-beam Lithography, Microscopy +22

Learning from native defects on EUV mask blanks

Emily Gallagher, Alfred Wagner, Mark Lawliss et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 10 citations

Native Defects, Machine Vision, Machine Learning +15