Gregory McIntyre

Integration of EUV lithography in the fabrication of 22-nm node devices

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 49 citations · Full text

DTCO at N7 and beyond: patterning and electrical compromises and opportunities

Julien Ryckaert, Praveen Raghavan, P. Schuddinck et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 32 citations

Engineering, Vlsi Design, Vertical Transistor +16

Polarization aberration analysis in optical lithography systems

Jongwook Kye, Gregory McIntyre, Yamamoto Norihiro et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 30 citations

Optical Materials, Engineering, Microscopy +16

Insertion strategy for EUV lithography

Obert R. Wood, John Arnold, Timothy A. Brunner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 30 citations

Short Wavelength Optic, Optical Materials, Engineering +19

Modeling and experiments of non-telecentric thick mask effects for EUV lithography

Gregory McIntyre, Chiew-Seng Koay, Martin Burkhardt et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 24 citations

Engineering, Electron-beam Lithography, Euv Lithography +16