H. Ochimizu

In Situ Growth of Bi-Sr-Ca-Cu-O Thin Films by Molecular Beam Epitaxy Technique with Pure Ozone

Yoshimi Nakayama, H. Ochimizu, Atsutaka Maeda et al. · Japanese Journal of Applied Physics · 1989 · 67 citations

Natural Sciences, Materials Engineering, Materials Science +15

The influence of the size effect of copper interconnects on RC delay variability beyond 45nm technology

Hideki Kitada, Takashi Suzuki, T. Kimura et al. · 2007 · 29 citations

Engineering, Electrical Engineering, Electronic Materials +16

High-Performance and Low-Power Bulk Logic Platform Utilizing FET Specific Multiple-Stressors with Highly Enhanced Strain and Full-Porous Low-k Interconnects for 45-nm CMOS Technology

T. Miyashita, Keiji Ikeda, Y. S. Kim et al. · 2007 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +17

Effect of strained InGaAs step bunching on mobility and device performance in n-InGaP/InGaAs/GaAs pseudomorphic heterostructures grown by metalorganic vapor phase epitaxy

T. Kikkawa, Kozo Makiyama, H. Ochimizu et al. · Journal of Crystal Growth · 1994 · 14 citations

Engineering, Electrical Engineering, Materials Science +17