Shintaro Kawata

Projection reduction exposure with variable axis immersion lenses: Next generation lithography

H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations

Engineering, Microscopy, Optic Design +18

<title>Nikon EB stepper: its system concept and countermeasures for critical issues</title>

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 31 citations

Critical Issues, Engineering, Electron-beam Lithography +17

Stencil reticle development for electron beam projection system

Shintaro Kawata, Norihiro Katakura, Shinichi Takahashi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 27 citations

Engineering, Electron-beam Lithography, Microscopy +17

Spatial coherence of KrF excimer lasers

Shintaro Kawata, Ikuo Hikima, Yutaka Ichihara et al. · Applied Optics · 1992 · 27 citations

Photonics, Engineering, Laser Science +13

Direct measurement of Coulomb effects in electron beam projection lithography

Takehisa Yahiro, Shohei Suzuki, Takeshi Irita et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 13 citations

Engineering, Electron-beam Lithography, Microscopy +18