Statistics
Publications
4
Citations
262
H-Index
4
Active since
1982
Affiliations
IBM (United States)(Current)
J. E. Lieberman is an author at IBM (United States) specializing in natural sciences, optics, and optical lithography.
Publications per year
1982–2001
4
4
Projection reduction exposure with variable axis immersion lenses: Next generation lithography
H. C. Pfeiffer, R. S. Dhaliwal, S. D. Golladay et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 61 citations
Natural Sciences, Manufacturing Engineering, Biomedical Optics +11
1–4 of 4