Ton Kiers

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

Joost Bekaert, Paolo Di Lorenzo, Ming Mao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 26 citations

Engineering, Computer Engineering, Materials Science +8

Normal-incidence spectroscopic ellipsometry and polarized reflectometry for measurement and control of photoresist critical dimension

James M. Holden, Thomas Gubiotti, William A. McGahan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 16 citations

Engineering, Electrical Engineering, Optoelectronics +16

Investigating process variability at ppm level using advanced massive eBeam CD metrology and contour analysis

Bertrand Le-Gratiet, Olivier Mermet, Christian Gardin et al. · 2019 · 14 citations

Engineering, Automotive Engineering, Electrical Engineering +17

Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology

Amine Lakcher, Bertrand Le-Gratiet, J. Ducoté et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 11 citations

Engineering, Manufacturing Engineering, 3D Modeling +16

Co-optimization of lithographic and patterning processes for improved EPE performance

Mark J. Maslow, Vadim Timoshkov, Ton Kiers et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 10 citations

Engineering, Materials Science, Digital Fabrication +10