Sudhar Raghunathan

Integration of EUV lithography in the fabrication of 22-nm node devices

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 51 citations · Full text

Engineering, Electrical Engineering, Materials Science +16

Insertion strategy for EUV lithography

Obert R. Wood, John Arnold, Timothy A. Brunner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 31 citations

Engineering, Electrical Engineering, Manufacturing Engineering +12

Imaging impact of multilayer tuning in EUV masks, experimental validation

Vicky Philipsen, Eric Hendrickx, Erik Verduijn et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 23 citations

Engineering, Technology Management, Biomedical Imaging +11

EUV lithography at the 22nm technology node

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Engineering, Computer Engineering, Electrical Engineering +17

Improving scanner wafer alignment performance by target optimization

Philippe Leray, Christiane Jehoul, Robert Socha et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 12 citations

Engineering, Manufacturing Engineering, Design Automation +12