A.M. Waite

High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography

P. Agnello, T. Ivers, C. Warm et al. · 2006 · 115 citations

Engineering, Vlsi Design, Enhanced Strain +21

High-performance nMOSFETs using a novel strained Si/SiGe CMOS architecture

Sarah H. Olsen, A.G. O’Neill, L.S. Driscoll et al. · IEEE Transactions on Electron Devices · 2003 · 86 citations

Electrical Engineering, Semiconductor Device, Engineering +10

Equations for estimating bankfull channel geometry and discharge for streams in Massachusetts

Gardner C. Bent, A.M. Waite · Scientific investigations report · 2013 · 48 citations · Full text

River Basin Management, Engineering, Water Resources +15

Effective mobilities in pseudomorphic Si/SiGe/Si p-channel metal-oxide-semiconductor field-effect transistors with thin silicon capping layers

Michael J. Palmer, G. Braithwaite, T. J. Grasby et al. · Applied Physics Letters · 2001 · 45 citations · Full text

Electrical Engineering, Effective Mobilities, Engineering +11

Optimization of Alloy Composition for High-Performance Strained-Si–SiGe N-Channel MOSFETs

Sarah H. Olsen, A.G. O’Neill, L.S. Driscoll et al. · IEEE Transactions on Electron Devices · 2004 · 20 citations

Strained-si-sige Devices, Electrical Engineering, Semiconductor Device +8