Katsura Otaki

Development of the point diffraction interferometer for extreme ultraviolet lithography: Design, fabrication, and evaluation

Katsura Otaki, K. Ota, Iwao Nishiyama et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 77 citations

Natural Sciences, Physics, Metrology +15

Asymmetric Properties of the Aerial Image in Extreme Ultraviolet Lithography

Katsura Otaki · Japanese Journal of Applied Physics · 2000 · 54 citations

Natural Sciences, Physics, Optical Materials +15

Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror

Katsura Otaki, Takahiro Yamamoto, Yusuke Fukuda et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 35 citations

Natural Sciences, Physics, Biomedical Optics +14

Angular spectrum calculations for arbitrary focal length with a scaled convolution

Satoru Odate, Chiaki Koike, Hidemitsu Toba et al. · Optics Express · 2011 · 31 citations · Full text

Natural Sciences, Physics, Biomedical Optics +9

<title>Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations</title>

Christof G. Krautschik, Masaaki Ito, Iwao Nishiyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +14