J. Żach

Upper limits for the residual aberrations of a high-resolution aberration-corrected STEM

M. Haider, Stephan Uhlemann, J. Żach · Ultramicroscopy · 2000 · 174 citations

Adaptive Optic, Engineering, High-resolution Aberration-corrected Stem +11

First application of Cc-corrected imaging for high-resolution and energy-filtered TEM

B. Kabius, Peter Hartel, M. Haider et al. · Journal of Electron Microscopy · 2009 · 132 citations

High Resolution, Engineering, Microscopy +21

Information Transfer in a TEM Corrected for Spherical and Chromatic Aberration

M. Haider, Peter Hartel, Heiko Müller et al. · Microscopy and Microanalysis · 2010 · 114 citations

Prerequisites for a Cc/Cs-corrected ultrahigh-resolution TEM

M. Haider, Heiko Müller, Stephan Uhlemann et al. · Ultramicroscopy · 2007 · 103 citations

High Resolution, Engineering, Measurement +6

Current and future aberration correctors for the improvement of resolution in electron microscopy

M. Haider, Peter Hartel, Heiko Müller et al. · Philosophical Transactions of the Royal Society A Mathematical Physical and Engineering Sciences · 2009 · 80 citations

Engineering, Microscopy, Future Aberration Correctors +17