Gabriel G. Barna

A comparison of principal component analysis, multiway principal component analysis, trilinear decomposition and parallel factor analysis for fault detection in a semiconductor etch process

Barry M. Wise, Neal B. Gallagher, Stephanie Watts Butler et al. · Journal of Chemometrics · 1999 · 291 citations

Engineering, Electrical Engineering, Instrumentation +16

A complex impedance analysis of the ionic conductivity of Na1+xZr2SixP3−xO12 ceramics

M. Bayard, Gabriel G. Barna · Journal of Electroanalytical Chemistry · 1978 · 90 citations

Natural Sciences, Materials Engineering, Materials Science +15

Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating

Neal B. Gallagher, Barry M. Wise, Stephanie Watts Butler et al. · IFAC Proceedings Volumes · 1997 · 84 citations

Engineering, Manufacturing Engineering, Systems Engineering +17

Spatial characterization of wafer state using principal component analysis of optical emission spectra in plasma etch

David A. White, Duane S. Boning, Stephanie Watts Butler et al. · IEEE Transactions on Semiconductor Manufacturing · 1997 · 56 citations

Natural Sciences, Manufacturing Engineering, Spatial Data Analysis +15

Statistical feedback control of a plasma etch process

P.K. Mozumder, Gabriel G. Barna · IEEE Transactions on Semiconductor Manufacturing · 1994 · 46 citations

Engineering, Manufacturing Engineering, Systems Engineering +17