Agnes Verbist

<title>Comparison between wet HF etching and vapor HF etching for sacrificial oxide removal</title>

Ann Witvrouw, Bert Du Bois, Piet De Moor et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 98 citations

Wet Hf Etching, Engineering, Silicon On Insulator +16

IR bolometers made of polycrystalline silicon germanium

Sherif Sedky, Paolo Fiorini, Matty Caymax et al. · Sensors and Actuators A Physical · 1998 · 93 citations

Materials Science, Engineering, Infrared Sensor +4

New low-stress PECVD poly-SiGe layers for MEMS

Cristina Rusu, Sherif Sedky, Brigitte Parmentier et al. · Journal of Microelectromechanical Systems · 2003 · 47 citations

Engineering, Thin Film Process Technology, Plasma Processing +19

Highly reliable CMOS-integrated 11MPixel SiGe-based micro-mirror arrays for high-end industrial applications

L. Haspeslagh, Jeroen De Coster, Olalla Varela Pedreira et al. · 2008 · 31 citations

Optical Materials, Engineering, Device Integration +26

Processing of MEMS gyroscopes on top of CMOS ICs

Ann Witvrouw, Ankit Nalin Mehta, Agnes Verbist et al. · 2005 · 28 citations

Cmos Chip, Wafer Scale Processing, Engineering +10