Statistics
Publications
7
Citations
105
H-Index
7
Active since
1992
Affiliations
Toshiba Machine (Japan)(Current)
Kenji Ohtoshi is an author at Toshiba Machine (Japan) specializing in engineering, microelectronics, and electron beam mask writing.
Publications per year
1992–2018
7
7
Investigation of recycling in the GAMMA 10 tandem mirror
Y. Nakashima, K. Yatsu, Kazuyoshi Tsuchiya et al. · Journal of Nuclear Materials · 1992 · 36 citations
EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 17 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 11 citations
Engineering, Manufacturing Engineering, Electronic Materials +9
Multibeam mask writer MBM-1000
Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 11 citations
EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 10 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
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