P. Aum

Impact of polysilicon dry etching on 0.5 /spl mu/m NMOS transistor performance: the presence of both plasma bombardment damage and plasma charging damage

T. Gu, Murat Okandan, Osama O. Awadelkarim et al. · IEEE Electron Device Letters · 1994 · 44 citations

Electrical Engineering, Polysilicon Antenna Ratio, Engineering +13

Plasma-damaged oxide reliability study correlating both hot-carrier injection and time-dependent dielectric breakdown

Xiang Li, Jen-Tai Hsu, P. Aum et al. · IEEE Electron Device Letters · 1993 · 30 citations

Engineering, Oxide Damage, Plasma Processing +16

Controlling plasma charge damage in advanced semiconductor manufacturing. Challenge of small feature size device, large chip size, and large wafer size

P. Aum, R. Brandshaft, D. Brandshaft et al. · IEEE Transactions on Electron Devices · 1998 · 23 citations

Plasma Charge Damage, Electrical Engineering, Advanced Semiconductor Manufacturing +14

Degraded CMOS hot carrier life time-role of plasma etching induced charging damage and edge damage

Xiaoyu Li, Tomasz Brożek, P. Aum et al. · 1995 · 20 citations

Edge Damage, Hc Lifetime, Electrical Engineering +13

Reappearance of plasma induced oxide charge underFowler-Nordheim stress

X. Li, Jen-Tai Hsu, P. Aum et al. · Electronics Letters · 1994 · 19 citations