Akito Hirano

Comprehensive Study of V<inf>FB</inf> Shift in High-k CMOS - Dipole Formation, Fermi-level Pinning and Oxygen Vacancy Effect

Y. Kamimuta, Kunihiko Iwamoto, Y.Nunoshige Y.Nunoshige et al. · 2007 · 52 citations

Engineering, Fermi-level Pinning, Semiconductor Device +17

Intrinsic Origin of Electron Mobility Reduction in High-k MOSFETs - From Remote Phonon to Bottom Interface Dipole Scattering

Hiroyuki Ota, Akito Hirano, Yukimune Watanabe et al. · 2007 · 31 citations

Electrical Engineering, Intrinsic Origin, Engineering +13

Impact of Surface Hydrophilicization prior to Atomic Layer Deposition for HfO₂/Si Direct-Contact Gate Stacks

Yukinori Morita, Akito Hirano, Shinji Migita et al. · Applied Physics Express · 2008 · 21 citations

Materials Science, Surface Characterization, Chemical Engineering +11

Gate-First Processed FUSI/HfO<inf>2</inf>/HfSiO<inf>x</inf>/Si MOSFETs with EOT=0.5 nm - Interfacial Layer Formation by Cycle-by-Cycle Deposition and Annealing

Minoru Takahashi, Arito Ogawa, Akito Hirano et al. · 2007 · 13 citations

Semiconductor Technology, Cycle-by-cycle Deposition, Electrical Engineering +10

Photodarkening and Photobrightening in Glasses Doped with CdS and CdS_xSe_1-x Nanocrystals

Tadaki Miyoshi, Akito Hirano, Tomomi Suenaga et al. · Japanese Journal of Applied Physics · 2000 · 12 citations

Engineering, Luminescent Glass, Optical Glass +20