Y.Nunoshige Y.Nunoshige

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Active since

2006

Affiliations

Shibaura Institute of Technology(Current)

The University of Tokyo

National Institute of Advanced Industrial Science and Technology

Association of Super-Advanced Electronics

Mirai Hospital

Y.Nunoshige Y.Nunoshige is an author at Shibaura Institute of Technology specializing in semiconductor devices, materials science, and electronic materials.

Publications per year

2006–2008

Publications

Comprehensive Study of V<inf>FB</inf> Shift in High-k CMOS - Dipole Formation, Fermi-level Pinning and Oxygen Vacancy Effect

Y. Kamimuta, Kunihiko Iwamoto, Y.Nunoshige Y.Nunoshige et al. · 2007 · 54 citations

Engineering, Electrical Engineering, Physics +13

The effect of oxygen in Ru gate electrode on effective work function of Ru/HfO2 stack structure

Toshihide Nabatame, Kouji Segawa, Masaru Kadoshima et al. · Materials Science in Semiconductor Processing · 2006 · 15 citations

Natural Sciences, Chemistry, Materials Science +12

Changes in effective work function of HfxRu1−x alloy gate electrode

Toshihide Nabatame, Y.Nunoshige Y.Nunoshige, Masaru Kadoshima et al. · Microelectronic Engineering · 2008 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +9

What is the Essence of VFB Shifts in High-k Gate Stack?

Toshihide Nabatame, Kunihiko Iwamoto, Koji Akiyama et al. · ECS Transactions · 2007 · 13 citations

Engineering, Materials Engineering, Materials Science +17

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